Chambers are unused and were never commissioned.

Susceptor, gas shower and other chamber kitting not included.    

Heater Band Cable For ATH M Series Turbo Pump

Cryotrap

Inline Molecular Sieve Trap

• Hot Filament CVD system engineered for CVD Diamond growth on a 4 inch (~100mm) rotary platen.
• Previously used for commercial R&D of polycrystalline CVD diamond materials.
• 4-inch system design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.
  • NOT intended or marketed for single-crystal diamond gemstone growth.
  • Related 12-inch (~300mm) production-scale diamond HFCVD equipment is also available. 

    4-inch HFCVD system design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species. Cline Innovations intends to coordinate reintegration/refurbishment of this system with updated controls and interlocks.  Reintegration will likely include PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible. 

EPI 3 1/4" Barrel Susceptor MTC EPI Reactor Parts For 3 Inch Wafers

Silicon Carbide 200 mm Disc Susceptor Carbone of America Part number 017893-001

Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.

Software Ver: B6.50

CB1 Amps: 300A

Vita Controller

Flow Point Model: Nano Valve

Gas Panel Type: Configurable

Wafer Size: 200mm (with conversion kit 150mm is possible)

M-Monitor: CRT

3 Chambers ATM EPI

With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC)

 Standard pneumatic waferlift

Center Finding System: OTF

Buffer robot: HP+

Piezocon sensor: No

VSB: Yes

Wide Body LL

Tool called "EPI39"

3 DXZ/CXZ Chambers for Centura/P5000Mainframe is transport rack 

Brand new and unused EPI Centura ACP 300 mm

4 Chambers;  Chamber code RH3, Lamp type BNA8 R3Mainframe Configuration E4 Single, 4 Facet SC ENP BLK2, Loadport AMAT Standard 300mm, EPI Water Module LT Design. RP EPI

Tool out of Project: "Yu Shan"

The original rough IFX Equipment procurement value was ~10,3 M€

Will be now sold for an attractive price.

 Equipment is... 

...brand new 

...never used  

...original packaged and crated 

...located in Asia 

...complete and fully functional 

...professional stored in Warehouse

APPLIED MATERIALS Centura TPCC EPN 

• Serial Number 21693; Manufactured in 2011
• Electro Polished Nickel Frame & Modules
• 2ea ENP Centura Loadlocks for 200mm Wafers
• Wafer Transfer Chamber with HP Robot
  • High Temperature Quartz End Effector
  • On the Fly Wafer Centering
  • 2ea TanOx Chambers - Positions C & D
  • 2ea ENP Fast Cooldown Chambers
  • V452 Main Control Board
  • Gas Panel with 2ea Gas Pallets
  • Interconnect Cables
  • AC Distribution Rack – 160A
  • Through the Wall Installation Kit
  • Please Inquire for Additional Details